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Construction Managers ▪ Design Builders

DuPont Electronics and Imaging

Marlborough, MA


Deep Ultraviolet Photolithography Semiconductor Fab


Project Features
  • 12,000 sf total
  • ISO 3 cleanroom
  • Temperature 68o± 1/2o F and humidity 45% ± 1% RH
  • Strict limitations on vibration, molecular outgassing, sound levels, and room pressurization

JM Coull completed the design and construction of the FAB 3-DUV, ISO 3 cleanroom for the Marlborough campus. The company is a global supplier of enabling materials found in consumer electronics, flat-panel displays, and telecommunications.
Delivery Method:
Design-Build

Architect:
Lockwood Greene, Spartanburg, SC

Award Winner:
ABC MA Chapter Excellence in Construction Award
“This was the most complex construction project ever completed at a Shipley facility. It requires a class 1 cleanroom with a half degree of tolerance in temperature, a one percent tolerance in relative humidity, ultra stable process table and the minimization of outgassing materials throughout the construction."

– Lou Leone, Director of Corporate Engineering, Dow Chemical